Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) are two critical techniques used in nanofabrication for creating thin films and nanostructures. CVD involves the deposition of material from a gas phase onto a substrate, allowing for the growth of thick films and providing excellent uniformity over large areas. In contrast, ALD is a more precise method that deposits materials one atomic layer at a time, which enables exceptional control over film thickness and composition. This atomic-level precision makes ALD particularly suitable for complex geometries and high-aspect-ratio structures, where uniformity and conformality are crucial. While CVD is generally faster and more suited for bulk applications, ALD excels in applications requiring precision and control at the nanoscale, making each technique complementary in the realm of nanofabrication.
Start your personalized study experience with acemate today. Sign up for free and find summaries and mock exams for your university.